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Tungsten Silicide Powder

Product Name: Tungsten Silicide Powder

Product Name Tungsten Silicide Powder
Product Code NCZ-VA-104/21
CAS No 12039-88-2
Molecular Formula Si2W
APS -100mesh,granule,block
Appearance White powder
Purity 99%min
Melting Point 2800℃
Density 9.40 g/cm3
Applications Microelectronics as an electric shock material
Molar Mass 240.011 g/mol


Tungsten silicide is a replacement for earlier tungsten films. Tungsten silicide is also used as a barrier layer between silicon and other metals, e.g. tungsten. Tungsten silicide is also of value towards use in micro electro mechanical systems, where it is mostly applied as thin films for fabrication of micro scale circuits.


It is used in microelectronics as a contact material, with resistivity 60–80 μΩ cm; it forms at 1000 °C. It is often used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Tungsten silicide layers can be prepared by chemical vapour deposition, e.g. using monocline or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-Stoichiometric, and requires annealing to convert to more conductive Stoichiometric form.

Storage Conditions:

Airtight sealed, avoid light, and keep dry at room temperature. 

Please contact us for customization and price inquiry

Email: [email protected]

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.



Note: For pricing & ordering information, please contact us at [email protected]
Please contact us for quotes on Larger Quantities & Customization. E-mail: [email protected]


If you are planning to order large quantities for your industrial and academic needs, please note that customization of parameters (such as size, length, purity, functionalities, etc.) are available upon request.



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